AL998

AL998 is a high purity etch grade Alumina specifically developed for semiconductor processing applications.. AL998 is a superior wear resistant material which features excellent plasma & chemical resistance and excellent dielectric properties for high voltage applications. AL998 is a unique material as free silica in the grain boundaries have been eliminated and it has low sodium purity levels which enable fine finishes and polishes to be achieved.

AL998 is excellent for the manufacture of components for PVD, CVD and CMP oxide etch, ion implants, photolithography and manufacturing products for chamber critical semiconductor parts including: chamber liners, isolators, wafer paddles, shields and spacers/wafer lift pins and guide pins, injector tubes, gas nozzles, and insulator blocks.

Products made from AL998 can be produced using cold Isostatic and dry bag along with monostatic & uniaxial pressing and our ultrahigh precision machining can produce very tight dimensional tolerances (typical: +/-0.0001 inch [0.00025cm]).

We control every aspect of our manufacturing process; from sourcing the raw ceramic powder to the production phase our customers can be confident that not only will their components be fully tested and effective, but will also offer complete material traceability.

Our engineers have the knowledge and practical understanding of how to utilise high Alumina ceramic materials to their greatest effect so contact us to see how we can help you.

To view our full list of Technical Datasheets, click here.