AL995

AL995 is a high purity 99.5% Alumina which due to its purity, chemical resistance and high temperature capabilities prove invaluable for semiconductor applications. AL995 is electrically and dimensionally stable at high temperatures and has low particle generation. It features excellent dielectric properties and is resistant to abrasion and chemical attack. It will also accept moly-manganese metalizing for high temperature brazing of vacuum tight assemblies. AL995 is excellent for products that are to be metallized as it will readily accept moly-manganese metalizing for high temperature brazing of assemblies.

AL995 is a dense, non porous, vacuum tight material that has a consistent dielectric constant which makes it excellent for wafer processing and handling devices/components for semiconductor process chambers, sputtering targets, and fixtures. Our engineers also recommend AL995 for for laser devices for wide range of industrial, medical, and defence duties, power tubes for klystron and x-ray equipment and flow meters/pressure sensors.

Products made from AL995 can be lapped to very tight tolerances or can be produced using Isostatic or dry pressing and can be manufactured in prototype, batch or volume production.

We control every aspect of our manufacturing process; from sourcing the raw ceramic powder to the production phase our customers can be confident that not only will their components be fully tested and effective, but will also offer complete material traceability.

Our engineers have the knowledge and practical understanding of how to utilise high Alumina ceramic materials to their greatest effect so contact us to see how we can help you.

To view our full list of Technical Datasheets, click here.